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Description of sputter removal during auger depth profiling of rough oxide layers |
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| Authors: | S. Baunack R. Barchmann R. Winkler |
| Affiliation: | 1. Institut für Strukturforschung und Festk?rperanalytik, Institut für Festk?rper- und Werkstofforschung Dresden e.V., Postfach, D-01171, Dresden, Germany 2. Institut für Energietechnik, Technische Universit?t Dresden, Mommsenstrasse 13, D-01062, Dresden, Germany |
| Abstract: | A model for describing sputter depth profiles on rough surfaces is presented; this is based on the assumption that sputter removal occurs at preferred sites due to the intrinsically rough surface. The progress of sputtering is described by the growth and overlap of statistically distributed holes in the surface layer. Within this assumption the variation of the Auger signal intensity during sputtering is described by simple functions. The model is applied to the sputter removal of oxide layers formed on INCOLOY 800 in hot water. |
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