The effect of thermal annealing on the structural and mechanical properties of a-C:H thin films prepared by the CFUBM magnetron sputtering method |
| |
| Authors: | Yong Seob Park |
| |
| Institution: | a School of information and communication Engineering, Sungkyunkwan University, Republic of Korea
b Center for Advanced Plasma Surface Technology (CAPST), Sungkyunkwan University, Republic of Korea |
| |
| Abstract: | a-C:H films were prepared by closed-field unbalanced magnetron (CFUBM) sputtering on silicon substrates using argon (Ar) and acetylene (C2H2) gases, and the effects of post-annealing temperature on structural and mechanical properties were investigated. Films were annealed at temperatures ranging from 300 °C to 700 °C in increments of 200 °C using rapid thermal annealing equipment in vacuum ambient. Variations in microstructure were examined using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Surface and mechanical properties were investigated by atomic force microscopy (AFM), nano-indentation, residual stress tester, and nano-scratch tester. We found that the mechanical properties of a-C:H films deteriorated with increased annealing temperature. |
| |
| Keywords: | 68 49 Uv 81 15 Cd 81 05 Uw 62 20 Qp 83 85 St 82 37 Gk 61 46 Bc 87 64 Je |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
