Development of ultra-short pulse VUV laser system for nanoscale processing |
| |
Authors: | Masahito Katto Hironari Zushi Wataru Nagaya Shinya Harano Ryota Matsumoto Atushi Yokotani Masanori Kaku Shoichi Kubodera Noriaki Miyanaga |
| |
Affiliation: | (1) University of Duisbrug-Essen, Institute of Experimental Physics, Lotharstr. 1, 47048 Duisburg, Germany |
| |
Abstract: | ![]() We have developed intense vacuum ultraviolet (VUV) radiation sources for advanced material processing, such as photochemical surface reactions and precise processing on a nanometer scale. We have constructed a new VUV laser system to generate sub-picosecond pulses at the wavelength of 126 nm. A seed VUV pulse was generated in Xe as the 7th harmonic of a 882-nm Ti:sapphire laser. The optimum conversion was achieved at the pressure of 1.2 Torr. The seed pulse will be amplified by the Ar2*mathrm{Ar}_{2}^{*} media generated by an optical-field-induced ionization Ar plasma produced by the Ti:sapphire laser. We have obtained a gain coefficient of g=0.16 cm−1. Our developing system will provide VUV ultra-short pulses with sub-μJ energy at a repetition rate of 1 kHz. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |