Induced growth of high quality ZnO thin filmsby crystallized amorphous ZnO |
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Authors: | Wang Zhi-Jun Song Li-Jun Li Shou-Chun Lu You-Ming Tian Yun-Xi Liu Jia-Yi Wang Lian-Yuan |
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Affiliation: | Physics College of Jilin University, Changchun 130026, China; Department of Materials Science and Engineering, Kyoto University, Sakyo, Kyoto 606-8501, Japan; Dean Office, Changchun University, Changchun 130022, China; Laboratory of Excited State Processes of Chinese Academy of Sciences, Changchun Institute of Optics, vs-1mm Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China |
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Abstract: | This paper reports the induced growth of high quality ZnO thin filmby crystallized amorphous ZnO. Firstly amorphous ZnO was prepared bysolid-state pyrolytic reaction, then by taking crystallizedamorphous ZnO as seeds (buffer layer), ZnO thin films have beengrown in diethyene glycol solution of zinc acetate at 80,du. X-rayDiffraction curve indicates that the films were preferentiallyoriented [001] out-of-plane direction of the ZnO. Atomic forcemicroscopy and scanning electron microscopy were used to evaluatethe surface morphology of the ZnO thin film. Photoluminescencespectrum exhibits a strong ultraviolet emission while the visibleemission is very weak. The results indicate that high quality ZnOthin film was obtained. |
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Keywords: | amorphous ZnO Induced growth ZnO thin films |
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