The reactions of nitric oxide with nickel films as studied by x-ray photoelectron spectroscopy

X-ray photoelectron spectroscopy has been employed to study the reactions between nitric oxide and freshly deposited nickel films. When the nickel surface is treated with NO at pressures of less than 1 · 10^?4 torr for 60 s (6000L), the NO is dissociatively adsorbed with no oxidation of the nickel surface. When treated with 0.40 torr of NO that has been exposed to varying degrees of oxidation, the nickel surface is oxidized and species such as NO₃^?, NO₂^?, NO and N₂ may be found on the surface. The species found are determined by the extent of oxidation of NO.