The oxidation of Ni(100) studied by medium energy ion scattering |
| |
| Authors: | R.G. Smeenk R.M. Tromp J.W.M. Frenken F.W. Saris |
| |
| Affiliation: | FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands |
| |
| Abstract: | We have used Rutherford backscattering (RBS) in combination with channeling and blocking to study the initial stages of oxidation of the Ni(100) surface at 325 and 415 K. Not only the oxygen coverage as function of exposure has been measured, but also the amount of nickel taking part in the oxidation process, both quantitatively. RBS results for the oxidation at both temperatures are consistent with the lateral growth of NiO islands. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
