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Surface analysis of LiF films by electron stimulated desorption and x-ray photoelectron spectroscopy
Affiliation:1. Jiangsu Province Engineering Laboratory of High Efficient Energy Storage Technology and Equipments, School of Electrical and Power Engineering, China University of Mining and Technology, Xuzhou, 221116, China;2. Faculty of Engineering, Hokkaido University, Sapporo, 060-8628, Japan;1. Key Laboratory of Advanced Functional Materials, Key Laboratory of Functional Molecule Design and Interface Process, Anhui Jianzhu University, Hefei 230601, PR China;2. Key Laboratory of Novel Thin Film Solar Cells, Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031, PR China;3. Collaborative Innovation Center of Radiation Medicine of Jiangsu Higher Education Institutions, Soochow University, Suzhou 215123, PR China
Abstract:
Electron stimulated desorption and X-ray photoelectron spectroscopy studies of evaporated LiF films show that the films are Li-rich in the surface region (Li/F atomic ratio ∼ 3:1) with a contaminant overlayer which includes hydrocarbons and water. Substantial amounts of hydrogen are also directly bonded to LiF surface. Exposure of the films to RF-activated Ar plasma results in reduction of the Li/F stoichiometry by a factor of ∼ 2 and the removal of carbon from the surface. H2O and possibly other oxygen-containing species remain.
Keywords:
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