Chemical vapor deposition of ZrxTi1−xO2 and HfxTi1−xO2 thin films using the composite anhydrous nitrate precursors |
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Authors: | Qi Yue Shao Ai Dong Li Yan Dong Jian Qing Jiang |
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Institution: | a School of Materials Science and Engineering, Southeast University, Nanjing 211189, PR China b National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, PR China |
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Abstract: | Zr-Ti and Hf-Ti composite nitrates were successfully developed as single-source precursors for the chemical vapor deposition (CVD) of ZrxTi1−xO2 and HfxTi1−xO2 thin films. The Zr-Ti nitrate can be assumed as a solid solution of the individual Zr and Ti nitrates, and the Zr/Ti molar ratio in the deposited ZrxTi1−xO2 films is consistent with that in the precursor. The Hf-Ti nitrate appears to be a mixture of the Hf and Ti nitrates and the composition of the deposited HfxTi1−xO2 films depends remarkably on the heating time of precursor. Both ZrxTi1−xO2 and HfxTi1−xO2 films exhibit trade-off properties between band gap and dielectric constant. The obtained results suggest that ZrxTi1−xO2 and HfxTi1−xO2 films are promising candidates for gate dielectric application to improve the scalability and reduce the leakage current of the future complementary metal-oxide-semiconductor (CMOS) devices. |
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Keywords: | 77 55 +f 73 40 Qv 81 15 Gh |
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