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Strongly nonlinear luminescence in oxidized porous silicon films
Authors:Hideki Koyama   Leonid Tsybeskov  Philippe M. Fauchet
Affiliation:

Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA

Abstract:Partially oxidized free-standing porous silicon films show a strongly superlinear increase in photoluminescence (PL) intensity above a threshold cw excitation intensity of 10 W/cm2. The PL-intensity increase can be expressed by a power law with n9 as a function of the excitation intensity. The PL-peak wavelength of this emission is slightly redshifted from that at low-excitation levels. These changes are fully reversible and reproducible, but not observed in samples on substrate. We attribute this behavior to thermal reexcitation of carriers trapped at the dangling bond states in initially nonluminescent Si nanocrystallites.
Keywords:Porous silicon   Photoluminescence   High excitation effect   Superlinear increase   Free-standing film   Oxidation
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