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Quantitatively probing the means of controlling nanoparticle assembly on surfaces
Authors:Patete Jonathan M  Peng Xiaohui  Serafin Joseph M  Wong Stanislaus S
Institution:Department of Chemistry, State University of New York at Stony Brook, Stony Brook, New York 11794-3400, United States.
Abstract:As a means of developing a simple, cost-effective, and reliable method for probing nanoparticle behavior, we have used atomic force microscopy to gain a quantitative 3D visual representation of the deposition patterns of citrate-capped Au nanoparticles on a substrate as a function of (a) sample preparation, (b) the choice of substrate, (c) the dispersion solvent, and (d) the number of loading steps. Specifically, we have found that all four parameters can be independently controlled and manipulated in order to alter the resulting pattern and quantity of as-deposited nanoparticles. From these data, the sample preparation technique appears to influence deposition patterns most broadly, and the dispersion solvent is the most convenient parameter to use in tuning the quantity of nanoparticles deposited onto the surface under spin-coating conditions. Indeed, we have quantitatively measured the effect of surface coverage for both mica and silicon substrates under preparation techniques associated with (i) evaporation under ambient air, (ii) heat treatment, and (iii) spin-coating preparation conditions. In addition, we have observed a decrease in nanoparticle adhesion to a substrate when the ethylene glycol content of the colloidal dispersion solvent is increased, which had the effect of decreasing interparticle-substrate interactions. Finally, we have shown that substrates prepared by these diverse techniques have potential applicability in surface-enhanced Raman spectroscopy.
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