A study of cross-gas-flow to stabilize an atmospheric pressure glow plasma in a multi-pin-to-multi-cupped-plane negative corona discharge |
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| Institution: | 1. TRUMPF Huettinger Sp. z o.o., Marecka 47, 05-220 Zielonka, Poland;2. Materials and Engineering Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK;1. Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China;2. University of Chinese Academy of Sciences, 19A Yuquan Rd, Shijingshan District, Beijing 10049, China;1. Institute of Nanotechnology (NANOTEC), National Research Council (CNR), c/o Department of Chemistry, University of Bari “Aldo Moro”, via Orabona 4, 70126 Bari, Italy;2. Department of Chemistry, University of Bari “Aldo Moro”, via Orabona 4, 70126 Bari, Italy |
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| Abstract: | In a multi-pin-to-multi-cupped-plane DC negative corona discharge configuration, a stable and diffuse glow discharge controlled by a fast airflow was obtained. This paper investigates the effect of the air gas flow velocity and the electrode structure on the discharge mode transition and the stabilization of the glow discharge by means of electric measurements and emission records. The stabilization mechanism of the glow discharge is discussed. The maximum glow discharge current reached 3.9 mA and the average current density was about 0.7 mA/cm2. |
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