Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography |
| |
Authors: | Mendes Paula M Jacke Susanne Critchley Kevin Plaza Jose Chen Yu Nikitin Kirill Palmer Richard E Preece Jon A Evans Stephen D Fitzmaurice Donald |
| |
Institution: | School of Chemistry, University of Birmingham, Edgbaston, Birmingham B15 2TT, United Kingdom. |
| |
Abstract: | This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|