Raman scattering from small particle size polycrystalline silicon |
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| Authors: | Z. Iqbal S. Vepřek A.P. Webb P. Capezzuto |
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| Affiliation: | Institute of Inorganic Chemistry, University of Zürich, Winterthurerstrasse 190, 8057 Zürich, Switzerland |
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| Abstract: | ![]()
Raman scattering measurements are reported on polycrystalline silicon films prepared in a hydrogen plasma at temperatures between 70 and 400°C. The spectra show several features which are correlated with X-ray diffraction measurements and assigned to crystalline and amorphous-like components. |
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