Fabrication and characterization of sliced multilayer transmission grating for X-ray region |
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| Authors: | Qiushi Huang Haochuan Li Jingtao Zhu Xiaoqiang Wang Zhanshan Wang Lingyan Chen and Yongjian Tang |
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| Institution: | 1 Key Laboratory of Advanced Micro-Structured Materials, MOE, Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China 2 Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China |
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| Abstract: | To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi 2 /Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region. |
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