光学薄膜的等离子体离子镀的研究

根据薄膜沉积过程等离子体对光学薄膜膜蒸气分子或原子的作用，建立低压等离子体离子镀设备，并对常规光学薄膜、如硫化物、氧化物薄膜以及多层膜器件进行了系统的研究，对所制备薄膜样品的透射光谱、吸收、散射以及膜层的聚集密度等进行了全面的测试分析。实验研究表明，低压等离子体离子镀可大大提高常规光学薄膜的光机性能。

Studies of Optical Thin Film Deposited by Plasma Ion Plating

A low voltage plasma ion plating (LVIP) system has been set up based on the actions of plasma with the coating vaporant during thin film deposition. The conventional optical thin film materials, such as sulphide, oxides and multilayer thin film devices have been studied using this system. The spectral transmittance, absorption, sacttering and the packing density of the films have been measured and analyzed. Experiment results show that LVIP can improve significantly the optical and mechanical performance of the thin films deposited.