Effect of substrate temperature and oxygen partial pressure on microstructure and optical properties of pulsed laser deposited yttrium oxide thin films

Yttrium oxide thin films were deposited on Si (1 1 1) and quartz substrates by pulsed laser deposition technique at different substrate temperature and oxygen partial pressure. XRD analysis shows that crystallite size of the yttrium oxide thin films increases as the substrate temperature increases from 300 to 873 K. However the films deposited at constant substrate temperature with variable oxygen partial pressure show opposite effect on the crystallite size. Band gap energies determined from UV-visible spectroscopy indicated higher values than that of the reported bulk value.