Optical properties of p-type CuAlO2 thin film grown by rf magnetron sputtering |
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| Authors: | Min FangHaiping He Bin LuWeiguang Zhang Binghui ZhaoZhizhen Ye Jingyun Huang |
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| Affiliation: | State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China |
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| Abstract: | We report the structural and optical properties of copper aluminium oxide (CuAlO2) thin films, which were prepared on c-plane sapphire substrates by the radio frequency magnetron sputtering method. X-ray photoelectron spectroscopy (XPS) along with X-ray diffraction (XRD) analysis confirms that the films consist of delafossite CuAlO2 phase only. The optical absorption studies show the indirect and direct bandgap is 1.8 eV and 3.45 eV, respectively. Room temperature photoluminescence (PL) measurements show three emission peaks at 360 nm (3.45 eV), 470 nm (2.63 eV) and 590 nm (2.1 eV). The first one is near band edge emission while the other two are originated from defects. |
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| Keywords: | Rf magnetron sputtering CuAlO2 thin films Photoluminescence |
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