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Solvent vapor induced morphology transition in thin film of cylinder forming diblock copolymer
Authors:Yuhu LiHaiying Huang  Tianbai He  Yumei Gong
Institution:a State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, PR China
b School of Chemical and Material, Dalian Polytechnic University, Dalian 116034, PR China
Abstract:The morphology formation and transition of thin film of a cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer annealed under 1,1,2-trichloroethane (Tri-CE), toluene (Tol), and their binary mixed solvent vapors is investigated by using optical microscopy (OM) and transmission electronic microscopy (TEM). By modulating the annealing solvent vapor pressure and the preferential affinities, a detailed morphology evolution with increasing the vapor pressure and a series of morphologies depending on the preferential affinities have been observed. A phase diagram by plotting the morphologies as a function of the annealing solvent vapor pressure and its preferential affinity is subsequently constructed.
Keywords:Controlled solvent vapor pressure annealing  Diblock copolymers  Self-assembly
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