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| X射线Kirkpatrick-Baez显微镜用超反射镜的研制 | |
| 引用本文： | 顾春时, 王占山, 王风丽, 等. X射线Kirkpatrick-Baez显微镜用超反射镜的研制[J]. 强激光与粒子束, 2006, 18(07). |
| 作者姓名： | 顾春时 王占山 王风丽 张众 穆宝忠 秦树基 陈玲燕 |
| 作者单位： | 1.同济大学 精密光学工程技术研究所 物理系, 上海 200092 |
| 摘 要： | 介绍了一种可应用于X射线Kirkpatrick-Baez（KB）显微镜的光学元件—X射线超反射镜。选用的W和B4C作为镀膜材料，膜对数为20，采用单纯型调优的方法实现了X射线超反射镜设计，用磁控溅射的方法在Si基片上完成了W/B4C X射线超反射镜的制备。采用高分辨率X射线衍射仪（8 keV）测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处，反射角度带宽为0.3°，反射率达到20%，可满足KB型显微镜的要求。 |
| 关 键 词： | 多层膜 X射线超反射镜 KB型显微镜 磁控溅射 反 |
Development of X-ray supermirrors used in Kirkpatrick-Baez microscope |
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| gu chun-shi, wang zhan-shan, wang feng-li, et al. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18. | |
| Authors: | gu chun-shi wang zhan-shan wang feng-li zhang zhong mu bao-zhong qin shu-ji chen ling-yan |
| Affiliation: | 1. Department of Physics,Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China |
| Abstract: | Design and fabrication of the X-ray supermirror used as reflective optical element in Kirkpatrick-Baez (KB) microscope were proposed. W/B4C was selected as coating materials pair. Design method and optimization of X-ray supermirrors were discussed. The designed multilayer structure was deposited on the Si wafer substrate using magnetron-sputtering system. The reflectivities of W/B4C supermirrors were measured by X-ray diffraction instrument (8 keV). The reflectivities of supermirrors are 20% at 1.052° and 1.143° designed grazing incident angles. The bandwidth of reflective plateau reaches 0.3°, which can fulfill the requirements of KB microscope. |
| Keywords: | multilayer x-ray supermirror kb microscope magnetron-sputtering reflectivity |
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