Kinetics of Formation of an Oxide Film on the Surface of the Cathode in an Atmospheric-Pressure Glow Discharge in Helium |
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Authors: | V. I. Arkhipenko V. Z. Greben' V. A. Dlugunovich S. M. Zgirovskii L. V. Simonchik |
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Affiliation: | (1) Institute of Molecular and Atomic Physics, National Academy of Sciences of Belarus, 70 F. Skorina Ave., Minsk, 220072, Belarus;(2) B. I. Stepanov Institute of Physics, National Academy of Sciences of Belarus, Minsk, Belarus |
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Abstract: | ![]() The kinetics of formation of an oxide film on the surface of the cathode of an atmospheric-pressure glow discharge in helium has been investigated by the method of laser reflectometry. It has been established that the film is formed at a cathode temperature exceeding 550 K, and in 200 sec from the time of discharge initiation at a current of 1 A it becomes thicker than 1 m. The film consists of several concentric zones. For each of these zones, a change in time of the directional hemispherical coefficient of reflection at a wavelength of 0.63 m was determined. It is shown that the formation of an oxide film on the cathode surface leads to an increase in the cathode drop. |
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Keywords: | laser reflectometry directional hemispherical coefficient of reflection atmospheric-pressure glow discharge oxide film |
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