Cu-diffused layers in LiNbO3 for reversible holographic storage |
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Authors: | Osamu Mikami |
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Affiliation: | Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, Musashino, Tokyo, Japan |
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Abstract: | ![]() Some holographic recording characteristics of Cu-diffused layers fabricated in Rh-doped LiNbO3 have been examined in comparison with those fabricated in undoped lithium niobate.The diffusion layers, whose thickness depends on the diffusion temperature, are found to be enormously susceptible to optically-induced refractive index changes and to be able to attain a high diffraction efficiency. A distinguished difference is found between the persistence of holograms stored in Rh-doped and undoped LiNbO3. |
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