Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films |
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| Authors: | M.S.R.N. Kiran M. Ghanashyam Krishna K.A. Padmanabhan |
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| Affiliation: | a School of Physics, University of Hyderabad, Hyderabad-500 046, Indiab Department of Materials Engineering, Indian Institute of Science, Bangalore-560 012, Indiac Centre for Nanotechnology, University of Hyderabad, Hyderabad-500 046, Indiad School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad-500 046, Indiae Institute of Materials Physics, University of Muenster, Germany |
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| Abstract: | ![]()
Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nano-grain sized, films at ambient temperature is demonstrated. The microstructure of the films grown on crystalline substrates reveals a larger grain size/crystallite size than that of the films deposited on amorphous substrates. Specular reflectance measurements on films deposited on different substrates indicate that the position of the Ti-N 2s band at 2.33 eV is substrate-dependent, indicating substrate-mediated stoichiometry. This clearly demonstrates that not only structure and microstructure, but also chemical composition of the films is substrate-influenced. The films deposited on amorphous substrates display lower hardness and modulus values than the films deposited on crystalline substrates, with the highest value of hardness being 19 GPa on a lanthanum aluminate substrate. |
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| Keywords: | A. Thin films D. Optical properties D. Mechanical properties |
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