Spin coating process of sol-gel silicate films deposition: Effect of spin speed and processing temperature |
| |
| Authors: | Konstantin Vorotilov Vladimir Petrovsky Vladimir Vasiljev |
| |
| Institution: | (1) Moscow Institute of Radioengineering, Electronics and Automation, Vernadsky prosp., 78, 117454 Moscow, Russia |
| |
| Abstract: | The effect of two factors having the most important influence on spin coating process of sol-gel films: the spin speed and the temperature (of the substrate and the applied solution) during film deposition is discussed. It is shown, that film thickness and thickness uniformity are determined by centrifugal driving force dynamics, viscous polymer rheology, solvent evaporation dynamics, and film porous microstructure. |
| |
| Keywords: | sol-gel film spin coating process spin speed processing temperature |
| 本文献已被 SpringerLink 等数据库收录！ |
|
