The influence of chemical treatment and thermal annealing on AlxGa1−xN surfaces: An XPS study

The influences of chemical treatment and thermal annealing of Al_xGa_1−xN (x = 0.20) have been investigated by X-ray photoelectron spectroscopy (XPS). XPS analysis showed that successive chemical treatments and annealing produced changes in the stoichiometry of the Al_xGa_1−xN surface, with the surface concentration of N increasing and Al and Ga decreasing with increasing temperature. Band bending occurred at the Al_xGa_1−xN surface, in parallel with the observed changes in stoichiometry. These results are discussed in the context of the creation of surface states via the activation of vacancies and induced by defects. These findings point towards the possibility of selecting and/or engineering the band structure at Al_xGa_1−xN surfaces through a combination of surface preparation and annealing.