Effect of oxidation on the optical and surface properties of AlGaN |
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Authors: | X.L. Wang D.G. Zhao X.Y. Li H. Yang |
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Affiliation: | a State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, CAS, P.O. Box 912, Beijing 100083, China b Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China |
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Abstract: | ![]() The chemical properties of AlxGa1−xN surfaces exposed to air for different time periods are investigated by atomic force microscopy (AFM), photoluminescence (PL) measurement and X-ray photoelectron spectroscopy (XPS). PL and AFM results show that AlxGa1−xN samples exhibit different surface characteristics for different air-exposure times and Al contents. The XPS spectra of the Al 2p and Ga 2p core levels indicate that the peaks shifted slightly, from an Al N to an Al O bond and from a Ga N to a Ga O bond. All of these results show that the epilayer surface contains a large amount of Ga and Al oxides. |
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Keywords: | 81.40Wx 81.65.&minus b |
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