| 不同厚度的MgB_2超薄膜的制备和性质研究 |
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| 引用本文： | 孙玄,黄煦,王亚洲,冯庆荣.不同厚度的MgB_2超薄膜的制备和性质研究[J].低温物理学报,2010(2). |
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| 作者姓名： | 孙玄 黄煦 王亚洲 冯庆荣 |
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| 作者单位： | 北京大学物理学院及人工微结构与介观物理国家重点实验室; |
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| 基金项目： | 国家自然科学基金(批准号:50572001);;“973计划”(批准号:2006CD601004);;国家大学生创新性实验计划(批准号:J0630311)资助的课题~~ |
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| 摘 要： | 本文报导了利用混合物理化学气相沉积法(Hybrid physical-chemical vapor deposition,HPCVD)在SiC(0001)衬底上制备干净的MgB2超薄膜.在背景气体压强、载气H2流量等条件一定的情况下,改变B2H6流量及沉积时间,制备不同厚度的MgB2超薄膜样品,并研究了超导转变温度Tc、剩余电阻率ρ(42K)、上临界场Hc2等与膜厚的关系.这系列超薄膜生长沿c轴外延,随膜厚度的变小Tc(0)降低,ρ(42K)升高.膜在衬底上的生长遵循Volmer-Weber岛状生长模式.对于10nm厚的膜,Tc(0)~32.4K,ρ(42K)~124.92μΩ·cm,其表面连接性良好,平均粗糙度为2.72nm,上临界磁场Hc2(0K)~12T,零场4K时的临界电流密度Jc~107A/cm2,为迄今为止所观测到的10nm厚MgB2超薄膜的最高Jc值,这也证明了10nm厚的MgB2膜在超导纳米器件上具有很强的应用潜力.
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| 关 键 词： | MgB2超薄膜 混合物理化学沉积法（HPCVD） 10nm厚超薄膜 |
PROPERTIES OF MGB2 ULTRA-THIN FILMS GROWN BY HYBRID PHYSICAL-CHEMICAL VAPOR DEPOSITION |
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| SUN Xuan HUANG Xu WANG Ya-zhou FENG Qing-rong School of Physics , State Key Laboratory for Artificial Microstructure , Mesoscopic Physics,Peking University,Beijing.PROPERTIES OF MGB2 ULTRA-THIN FILMS GROWN BY HYBRID PHYSICAL-CHEMICAL VAPOR DEPOSITION[J].Chinese Journal of Low Temperature Physics,2010(2). |
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| Authors: | SUN Xuan HUANG Xu WANG Ya-zhou FENG Qing-rong School of Physics State Key Laboratory for Artificial Microstructure Mesoscopic Physics Peking University Beijing |
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| Institution: | SUN Xuan HUANG Xu WANG Ya-zhou FENG Qing-rong School of Physics , State Key Laboratory for Artificial Microstructure , Mesoscopic Physics,Peking University,Beijing,100871 |
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| Abstract: | We fabricated MgB2 ultra-thin films via hybrid physical-chemical vapor deposition (HPCVD) technique. Under the same background pressure,the same H2 flow rate,by changing B2H6 flow rate and deposition time,we made a series of ultra-thin films,thickness ranging from 5nm to 80nm. These films grew on SiC substrate,all c-axis epitaxial. The film formation obeys the Volmer-Weber mode. As the thickness increases,critical transition temperature Tc(0) also increases,the residual resistivity decreases. Especially,a v... |
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| Keywords: | MgB2 ultra-thin film hybrid physical-chemical vapor deposition 10nm MgB2 film |
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