脉冲偏压电弧离子镀C-N-V薄膜的成分、结构与性能

用脉冲偏压电弧离子镀方法在硬质合金基体上制备了一系列不同成分的C-N-V薄膜.用X射线光电子能谱、激光Raman光谱、 X射线衍射(XRD)、透射电子显微镜(TEM)和纳米压痕等方法分别研究了薄膜的成分、结构与性能.Raman光谱，XRD和TEM结果表明，所制备的薄膜为在类金刚石(DLC)非晶基体上匹配有VN晶体的碳基复合薄膜.随V和N含量的增加，薄膜硬度与弹性模量先增加后下降，在N含量为204%，V含量为218%时薄膜硬度与弹性模量具有最大值，分别为368和5697 GPa，高于相同条件下制备的 关键词： C-N-V薄膜 类金刚石薄膜 纳米复合薄膜 电弧离子镀

Composition,microstructure and properties of C-N-V films prepared by pulsed bias arc ion plating

High quality C-N-V films with different compositions were prepared on cemented carbide substrate using pulsed bias arc ion plating. The surface morphology, composition, microstructure and properties of C-N-V films were investigated by scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy, Raman spectra, grazing incident X-ray diffraction, and nano-indentation, respectively. The results show that the deposited films were nanocomposite films with VN nanocrystalline phase imbedded within diamond-like carbon(DLC) amorphous matrix. The hardness and elastic modulus, which are closely related to the composition and structure of the film, first increase and then decrease with increasing V and N contents and have the highest values of 36.8 and 569.7 GPa exceeding that of pure DLC film prepared under the same condition when nitrogen content is 20.4% and vanadium content is 21.8%. The variation of V and N contents has significant influence on the phase structure, relative concentration of VN crystalline phase and DLC amorphous phase, and induces the formation of nano-diamond phase, hence has great effect on the properties of the films.