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Design and application of phase photon sieve |
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| Authors: | Wenbo Jiang Song Hu Wei Yan |
| Affiliation: | a Institute of Optics & Electronics, The Chinese Academy of Science, Chengdu 610209, China b Graduate School of the Chinese Academy of Science, Beijing 100039, China |
| Abstract: | The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography. |
| Keywords: | Imaging principle Phase photon sieve Design and fabrication Nano-lithography experiment system |
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