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Pulsed arc deposition of super-hard amorphous carbon films |
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| Authors: | H.?Schulz mailto:harald.schulz@iws.fraunhofer.de" title=" harald.schulz@iws.fraunhofer.de" itemprop=" email" data-track=" click" data-track-action=" Email author" data-track-label=" " >Email author,H.-J.?Scheibe,P.?Siemroth,B.?Schultrich |
| Affiliation: | (1) Fraunhofer Institut für Werkstoff- und Strahltechnik Dresden, Winterbergstrasse 28, 01277 Dresden, Germany |
| Abstract: | Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown. PACS 52.77.Dq; 68.60.-p; 81.15.Aa; 81.15.Ef; 81.70.Ex |
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