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Characteristics of dual-frequency capacitively coupled SF_6/O_2 plasma and plasma texturing of multi-crystalline silicon |
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| Authors: | Xu Dong-Sheng;Zou Shuai;Xin Yu;Su Xiao-Dong;Wang Xu-Sheng |
| Abstract: | dual frequency capacitively coupled plasma, plasma texturing, multi-crystalline silicon, electrondensity |
| Keywords: | dual frequency capacitively coupled plasma plasma texturing multi-crystalline silicon electron density |
| 本文献已被 CNKI 维普 等数据库收录！ | |