Deposition of C60 polymer films under various plasma conditions |
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| Authors: | M Ramm M Ata |
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| Institution: | (1) Bengal Engineering and Science University, Howrah, 711103, West Bengal, India;(2) Saha Institute of Nuclear Physics, 1/AF Bidhannagar, Kolkata, 700064, India;(3) Government College of Engineering and Ceramic Technology, 73 A.C.B. Lane, Kolkata, 700010, India;(4) Radiochemistry Division, Bhabha Atomic Research Centre, Mumbai, 400085, India; |
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| Abstract: | We studied the deposition of C60 polymer films under different Ar plasma conditions. The films were deposited at a pressure range between 1.3 and 40 Pa, and the input power was varied from 10 to 70 W. The films were investigated by Raman spectroscopy to confirm the C-C valence states of the polymeric phases. C60 polymers were formed under various experimental conditions. However, the depositions resulted in non-uniform films consisting of unpolymerized C60, dimers, linear chains and polymeric planes. Amorphous carbon was found in the films deposited at 13 and 20 Pa (50 W input power) and 13 Pa (70 W). |
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