InGaAs/GaAs photorefractive multiple quantum well device in quantum confined Stark geometry |
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Authors: | H. Kageshima S. Iwamoto M. Nishioka T. Someya K. Fukutani Y. Arakawa T. Shimura K. Kuroda |
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Affiliation: | (1) Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, Japan (Fax: +81-35452-6159, E-mail: iwamoto@iis.u-tokyo.ac.jp), JP |
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Abstract: | We have demonstrated photorefractive InGaAs/GaAs multiple-quantum-well devices in the quantum confined Stark geometry. A four-wave-mixing diffraction efficiency up to 0.3% is obtained at a wavelength of 949 nm. Proton implantation strongly reduces the maximum diffraction efficiency although it saturates the diffraction efficiency at smaller grating period comparing to as-grown device. We have also observed higher order diffractions. It is found that the space-charge field changes its pattern temporally from a sinusoidal pattern to a rectangular one with decreasing its modulation depth. Received: 7 December 2000 / Published online: 27 April 2001 |
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Keywords: | PACS: 42.60 42.65 42.70 |
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