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The Effect of the Ion Assistance Energy on the Electrical Resistivity of Carbon Films Prepared by Pulsed Plasma Deposition in a Nitrogen Atmosphere
Authors:Zavidovskii  I A  Streletskii  O A  Nishchak  O Yu  Khaidarov  A A
Institution:1. Moscow State University, Moscow, Russia
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Abstract:Physics of the Solid State - Thin carbon films prepared by pulsed plasma ion-assisted deposition of graphite in an atmosphere of a mixture of argon and nitrogen are studied. The results of...
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