Characterization of deposits produced by TEA CO2 pulsed laser ablation of silicon mono- and dioxide

Silicon based deposits were prepared by TEA CO₂ pulsed laser ablation (PLA) of SiO and SiO₂ targets in the atmosphere of selected gases (N₂, He, Ne, Ar, Kr). These deposits possess high specific area of several hundreds m² per gram. Owing to the high specific area, some chemical groups and hydrogen related radical were detected by means of FTIR and EPR analyses and theoretical calculations: silyl (E′ center) Si, silylen Si:, silanon SiO, POL (peroxy linkage) SiOOSi and/or NBOHC (non-bridging oxygen hole center) SiO, POR (peroxy radical) SiOO and dioxysilirane Si(O)₂. In SiO₂ deposits the concentration of silyl Si resp. POR SiOO was determined to be 5.8 × 10¹⁸/g resp. 6.2 × 10¹⁹/g. In SiO deposits the ratio [Si:]:[Si] = (3.1-5.7) × 10¹⁹/g: (5.3-9.8) × 10¹⁹/g was measured. Estimated concentration of [Si] in deposits was increased nearly five times in comparison with SiO target. After exposure of the SiO deposits to H₂ EPR doublet with hyperfine splitting of 7.7 mT was observed. The best agreement between calculated theoretical and experimental values was found for the model [(HO)₃SiO]₂HSi. FTIR measurements and calculations of the silanol theoretical model clusters enabled us to discuss the chemical surroundings of the silanol and to determine the defects in the deposits.