| YBCO涂层导体用YSZ缓冲层的快速制备研究 |
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| 引用本文： | 冯啸,熊杰,张飞,夏钰东,赵晓辉,陶伯万. YBCO涂层导体用YSZ缓冲层的快速制备研究[J]. 低温与超导, 2012, 2(2): 19-23,33. DOI: 10.3969/j.issn.1001-7100.2012.02.005 |
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| 作者姓名： | 冯啸 熊杰 张飞 夏钰东 赵晓辉 陶伯万 |
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| 作者单位： | 1.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054;2.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054;3.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054;4.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054;5.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054;6.电子科技大学电子薄膜与集成器件国家重点实验室,成都60054 |
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| 摘 要： | 基于反应直流溅射法,采用镶嵌有钇粒的金属锆作为靶材,去离子水蒸汽为氧化反应气体,在有Y2O3种子层的双轴织构Ni -5at.％W基带上,系统地研究了温度和卷绕速度对YSZ阻挡层薄膜结构及表面形貌的影响.X射线衍射(XRD)分析表明,生长温度在700℃时制备的薄膜呈现明显的(002)取向;原子力显微镜(AFM)分析显示,该温度下制备的薄膜表面致密、无孔洞、无裂纹.在不同的卷绕速度下,虽然薄膜均为纯c轴取向,但其均方根粗糙度(RMS)和微粒大小均有较大差别.快速制备可达到抑制基片表面氧化、助于薄膜取向改善、提高薄膜制备效率的目的.
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| 关 键 词： | 反应直流溅射 YSZ阻挡层 快速制备 生长温度 卷绕速度 |
The influences of rapid growth of yttria - stabilized ZrO2 buffer layers for YBCO coated conductors |
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| Feng Xiao , Xiong Jie , Zhang Fei , Xia Yudong , Zhao Xiaohui , Tao Bowan. The influences of rapid growth of yttria - stabilized ZrO2 buffer layers for YBCO coated conductors[J]. Cryogenics and Superconductivity, 2012, 2(2): 19-23,33. DOI: 10.3969/j.issn.1001-7100.2012.02.005 |
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| Authors: | Feng Xiao Xiong Jie Zhang Fei Xia Yudong Zhao Xiaohui Tao Bowan |
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| Affiliation: | (State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 610054,China) |
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| Abstract: | Direct current(dc) reactive sputtering is one of the most promising approaches for fabricating yttria-stabilized ZrO2(YSZ) buffer layers.In this paper,YSZ films were deposited on Y2O3-buffered Ni 5at.%W substrates with Zr target embedded with yttrium discs.The influences of the growth temperature and rolling speed were investigated detailedly.X-ray diffraction(XRD) measurement revealed that the YSZ films were preferential(002) orientation at 700℃.Atomic force microscopy(AFM) analysis indicated that the surface was smooth with few pores and crack free.The films prepared with different rolling speed were all c-axis oriented,however,their RMS and grain size were different.Rapid growth could restrain the oxidation of the substrates surface,improve the textures and enhance the fabricating efficiency. |
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| Keywords: | DC reactive sputtering YSZ buffer layers Rapid growth Growth temperature Rolling speed |
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