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Factors influencing the growth behaviour of nanoporous anodic films on iron under galvanostatic anodizing |
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| Authors: | Y Konno E Tsuji P Skeldon G E Thompson H Habazaki |
| Institution: | 1. Graduate School of Chemical Sciences and Engineering, Hokkaido University, Sapporo, Hokkaido, 060-8628, Japan 2. Division of Materials Chemistry, Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido, 060‐8628, Japan 3. Corrosion and Protection Centre, School of Materials, The University of Manchester, Manchester, M13 9PL, UK 4. Frontier Chemistry Center, Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido, 060‐8628, Japan |
| Abstract: | The growth behaviour of nanoporous anodic films on iron during galvanostatic anodizing in ethylene glycol electrolytes containing NH4F and H2O is examined at various current densities, H2O concentrations in electrolytes and temperatures. The film morphology is mainly controlled by the formation voltage, regardless of anodizing conditions. Relatively regular cylindrical pores are formed at formation voltages less than 50 V, while rather disordered pores are formed above 100 V. The decrease in the H2O concentration suppresses chemical dissolution of anodic films in addition to the increased growth efficiency, resulting in the formation of anodic films with a steady thickness of ～7 μm. The cell size of the anodic films depends upon the H2O concentration as well as the formation voltage, but not upon the current density. Findings in this study will be useful for controlled growth of the anodic films on iron. |
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