The effect of nitrogen ion implantation on tungsten surfaces |
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Authors: | H L Zhang D Z Wang N K Huang |
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Institution: | Institute of Nuclear Science and Technology, Sichuan University, Chengdu, 610064, China |
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Abstract: | X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were used to study the phase, composition and chemical states of elements at the tungsten surface. The measurement results indicate that nitrogen-containing phase of tungsten were formed by nitrogen ion implantation (energy 40 keV, implantation doses of 4×1017, 8×1017 and 1.6×1018 ions/cm2). The formation of the Wx(O,N) and WN in the surface layer occurred as a result of nitrogen ion irradiation. A decrease in concentration of Wx(O,N) is observed with increasing N+ while that WN increases. Due to residual oxygen in the chamber WO3 still exists at the surface of the specimen. |
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Keywords: | Nitrogen ion implantation δ-WN Microstructure analysis |
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