| 茜素修饰碳糊电极吸附伏安法测定痕量铜 |
| |
| 引用本文： | 谢红旗,李益恒,胡朝晖.茜素修饰碳糊电极吸附伏安法测定痕量铜[J].分析试验室,2001,20(1):39-41. |
| |
| 作者姓名： | 谢红旗 李益恒 胡朝晖 |
| |
| 作者单位： | 1. 湘潭大学化学系,
2. 长沙产品质量监督检验所, |
| |
| 基金项目： | 湖南省教委科研基金!资助项目 ( 98B0 0 7) |
| |
| 摘 要： | 报道了采用茜素修饰碳糊电极测定痕量铜的阳极溶出伏安法。在浓度为0 .1 mol/L 的 HAc- Na Ac缓冲溶液 (p H4.5)中 ,于 +0 .1 0 V处富集 ,- 0 .30 V还原后再进行阳极化扫描 ,于 - 0 .0 5V处获得一灵敏的铜的溶出峰 ,二次导数峰电流与铜浓度在 1 .6× 1 0 -9mol/L～ 4.7× 1 0 -7mol/L范围内呈线性关系 ,检出限达 8.0× 1 0 -10 mol/L。同时 ,对电极反应机理进行了讨论。方法应用于锌合金中铜的测定。
|
| 关 键 词： | 铜 茜素 碳糊修饰电极 吸附伏安法 锌合金 痕量分析 |
| 文章编号： | 1000-0720(2001)01-0039-03 |
Determination of Trace Copper by Adsorptive Voltammetry at an Alizarin Modified Carbon Paste Electrode |
| |
| XIE Hong-qi,LI Yi-heng,HU Zhao-hui.Determination of Trace Copper by Adsorptive Voltammetry at an Alizarin Modified Carbon Paste Electrode[J].Chinese Journal of Analysis Laboratory,2001,20(1):39-41. |
| |
| Authors: | XIE Hong-qi LI Yi-heng HU Zhao-hui |
| |
| Abstract: | An adsorptive voltammetric procedure for determination of trace copper at alizarin modified carbon paste electrode was described .In a 0.1 mol/L acetate buffer solution (pH 4.5),copper (Ⅱ) was accumulated on the electrode surface by formation of the complex at +0.10V(vs SCE),then determined by anodic stripping voltammery after cathodic reduction at -0.30V. A linear relationship between peak current and copper (Ⅱ) concentration was obtained in the range of 1.6×10-9～4.7×10-7 mol/L for a 3 min accumulation period with detection limit of 8×10-10 mol/L.The proposed method was satisfactorily applied to determination of copper in zinc alloy. |
| |
| Keywords: | |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
