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Surface plasmon interference pattern on the surface of a silver-clad planar waveguide as a sub-micron lithography tool
Authors:ZHU QiuXiang  HU C  ong  WANG WenJie  HE Miao  ZHOU Jun  ZHAO LingZhi  PENG ZhiXiang  LI ShuTi  ZHU Ning & ZHANG Yong Key Laboratory of Electroluminescent Devices of Guangdong Provincial Education
Institution:ZHU QiuXiang1,HU CanDong1,WANG WenJie2,HE Miao1,ZHOU Jun3,ZHAO LingZhi1,PENG ZhiXiang1,LI ShuTi1,ZHU Ning1 & ZHANG Yong1 1 Key Laboratory of Electroluminescent Devices of Guangdong Provincial Education Department,Institute of Optoelectronic Materials and Technology,South China Normal University,Guangzhou 510631,China,2 Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials,Department of Physics,Nanjing University,Nanjing 210093,3 Institute of Photonics,Faculty of Science,Ningb...
Abstract:A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad ultraviolet(UV) planar waveguide.A laser beam with a wavelength of 325 nm was incident into the waveguide core,and suffered a series of total internal reflections on the interfaces between the waveguide core and the cladding layers.The incident light and the reflected light induced two beams of SPWs traveling in contrary directions,which interfered wi...
Keywords:surface plasmon waves(SPW)  silver(Ag)-clad planar waveguide  solgel  sub-micron lithography  
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