| 用不同的Mo靶溅射功率制备Mo/Si多层膜 |
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| 引用本文： | 秦俊岭,邵建达,易葵.用不同的Mo靶溅射功率制备Mo/Si多层膜[J].强激光与粒子束,2007,19(1):67-70. |
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| 作者姓名： | 秦俊岭 邵建达 易葵 |
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| 作者单位： | 1. 中国科学院 上海光学精密机械研究所， 上海 201800; 2. 中国科学院 研究生院， 北京 100039 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 用磁控溅射法制备了周期厚度和周期数均相同的Mo/Si多层膜，用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时，Mo/Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。研究发现，随着Mo靶溅射功率的增大，Mo/Si多层膜的表面粗糙度增加，Mo的特征X射线衍射峰也增强，Mo/Si多层膜的软X射线峰值反射率先增大后减小。
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| 关 键 词： | Mo靶 Mo/Si多层膜 溅射功率 软X射线 反射率 |
| 文章编号： | 1001-4322(2007)01-0067-04 |
| 收稿时间： | 2006/6/29 |
| 修稿时间： | 2006-06-29 |
Mo/Si multilayers prepared with different sputtering power of Mo target |
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| QIN Jun-ling,SHAO Jian-da,YI Kui.Mo/Si multilayers prepared with different sputtering power of Mo target[J].High Power Laser and Particle Beams,2007,19(1):67-70. |
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| Authors: | QIN Jun-ling SHAO Jian-da YI Kui |
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| Institution: | 1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O.Box 800-211, Shanghai 201800, China; 2. Graduate School of Chinese Academy of Sciences, Beijing 100039, China |
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| Abstract: | Mo/Si multilayers were prepared by magnetron sputtering.With different sputtering power of Mo target,surface morphology and crystal phases of Mo/Si multilayers were studied by AFM and XRD.Soft X-ray reflectivity of Mo/Si multilayers were measured.As sputtering power of Mo target was increasing,surface roughness of Mo/Si film was increasing,characteristic diffraction peak of Mo species became stronger and stronger,furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced. |
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| Keywords: | Mo target Mo/Si multilayers Sputtering power Soft X-ray Reflectivity |
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