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Preparation and characterizations of amorphous nanostructured SiC thin films by low energy pulsed laser deposition |
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| Authors: | H. ElGazzar H.G. Salem F. Nassar |
| Affiliation: | a Department of Physics, The American University in Cairo, Cairo, Egypt b Department of Mechanical Engineering, The American University in Cairo, Cairo, Egypt c Yousef Jameel Science and Technology Research Center (YJ-STRC), The American University in Cairo, Cairo, Egypt d Department of Applied Chemistry, Faculty of Science, Al-Azhar University Cairo, Cairo, Egypt |
| Abstract: | Amorphous silicon carbide (SiC) thin films were deposited on silicon substrates by pulsed laser ablation at room temperature. Thicknesses and surface morphology of the thin films were characterized using optical profilers, atomic force and field emission scanning electron microscopy. Nanohardnes, modulus and scratch resistance properties were determined using XP nanoindenter. The results show that crack free, smooth and nanostructured thin films can be deposited using low laser energy densities. |
| Keywords: | Pulsed laser deposition Amorphous SiC thin films Surface morphology Nanoindentation |
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