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Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition
Authors:Jeffrey C Shearer  D Hoogeland
Institution:a Department of Chemistry, Colorado State University, Fort Collins, CO 80523-1872, USA
b Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands
Abstract:Plasma-enhanced chemical vapor deposition was used to conformally coat commercial TiO2 nanoparticles to create nanocomposite materials. Hexamethyldisiloxane (HMDSO)/O2 plasmas were used to deposit SiO2 or SiOxCyHz films, depending on the oxidant concentration; and hexylamine (HexAm) plasmas were used to deposit amorphous amine-containing polymeric films on the TiO2 nanoparticles. The composite materials were analyzed using Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). These analyses reveal film composition on the nanoparticles was virtually identical to that deposited on flat substrates and that the films deposit a conformal coating on the nanoparticles. The performance of the nanocomposite materials was evaluated using UV-vis spectroscopy to determine the dispersion characteristics of both SiOx and HexAm coated TiO2 materials. Notably, the coated materials stay suspended longer in distilled water than the uncoated materials for all deposited films.
Keywords:Plasma deposition  Composite nanomaterials  Titanium dioxide  Surface modification  Nanoparticles
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