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Room-temperature deposition of crystalline patterned ZnO films by confined dewetting lithography
Authors:S. Sepulveda-Guzman  B. Reeja-Jayan  U. Ortiz-Mendez  R. Cruz-Silva
Affiliation:a Centro de Innovación, Investigación y Desarrollo en Ingeniería y Tecnología. UANL, PIIT Monterrey, CP 66629, Apodaca NL, Mexico
b Texas Materials Institute, The University of Texas at Austin, Austin, TX 78712, USA
c Centro de Investigación en Optica, Loma del Bosque #115 Col. Lomas del Campestre C.P. 37150 León, Gto. Mexico
d Instituto Nacional de Astrofísica Optica y Electrónica, Calle Luís Enrique Erro No. 1, Santa María Tonanzintla, Puebla. Apdo. Postal 51 y 216, C.P. 72000 Puebla, Mexico
e Centro de Investigación en Ingeniería y Ciencias Aplicadas, UAEM. Av. Universidad 1001, Col. Chamilpa, CP 62210 Cuernavaca, Mor., Mexico
f Physics and Astronomy Department University of Texas at San Antonio 1604 campus San Antonio, TX 78249, USA
Abstract:In this work patterned ZnO films were prepared at room-temperature by deposition of ∼5 nm size ZnO nanoparticles using confined dewetting lithography, a process which induces their assembly, by drying a drop of ZnO colloidal dispersion between a floating template and the substrate. Crystalline ZnO nanoparticles exhibit a strong visible (525 nm) light emission upon UV excitation (λ = 350 nm). The resulting films were characterized by scanning electron microscopy (SEM) and atomic force microscope (AFM). The method described herein presents a simple and low cost method to prepare crystalline ZnO films with geometric patterns without additional annealing. Such transparent conducting films are attractive for applications like light emitting diodes (LEDs). As the process is carried out at room temperature, the patterned crystalline ZnO films can even be deposited on flexible substrates.
Keywords:Confined dewetting lithography   ZnO nanoparticles   Microcontact printing   Nano-patterning
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