Ultrasmall Ge islands with low diameter-to-height aspect ratio on Si(1 0 0)-(2 × 1) surfaces |
| |
Authors: | K. Bhattacharjee Anupam Roy Jay Ghatak B.N. Dev |
| |
Affiliation: | a Institute of Physics, Sachivalaya Marg, Bhubaneswar 751005, India b Department of Materials Science, Indian Association for the Cultivation of Science, 2A & 2B Raja S. C. Mullick Road, Jadavpur, Kolkata 700032, India |
| |
Abstract: | ![]() Scanning tunneling microscopy (STM) and high resolution cross-sectional transmission electron microscopy (XTEM) studies have been used to investigate the formation of Ge nanocrystals grown on Si(1 0 0)-(2 × 1) surfaces by molecular beam epitaxy (MBE). We observe relatively high density of Ge islands where small ‘pyramids’, small ‘domes’ and facetted ‘domes’ of various sizes co-exist in the film. As revealed from XTEM images, a large fraction of islands, especially dome-shaped Ge islands have been found to have an aspect ratio of ∼1 (diameter):1 (height). Observation of truncated-sphere-shaped Ge islands with a narrow neck contact with the wetting layer is reported. |
| |
Keywords: | Ge islands on Si Scanning tunneling microscopy Transmission electron microscopy |
本文献已被 ScienceDirect 等数据库收录! |
|