Preparation and Characterization of SiO2-MxOy(M = V, Sn, Sb) Thin Films from Silicic Acid and Metal Chlorides |
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| Authors: | Ahmet Ka?göz Yoshimoto Abe |
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| Institution: | (1) Department of Chemical Engineering, Faculty of Engineering,  stanbul University, Avcilar, 34850- stanbul, Turkey;(2) Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo, 2641 Yamazaki, Noda, Chiba, 278, Japan |
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| Abstract: | The preparation of SiO2-M
x
O
y
(M = V, Sn, Sb) binary oxide thin films by sol-gel method was investigated. The reaction of silicic acid with metal chloride (M = Sn and Sb) or oxychloride (M = V) formed homogeneous solutions. The dip-coating of slide glass and silicon wafer followed by heat treatment gave oxide films having Si—O—M bond. The changes of FT-IR spectra as a function of heat treatment temperature and molar composition confirmed the Si—O—M bonds. The sheet resistance of films increased with an increase on heat treatment temperature and decrease in the content of metal oxide M
x
O
y
. X-ray diffraction peaks were observed for the SiO2-V2O5 films with high V2O5 contents and heat-treated above 250°C, while the others were amorphous. Oxide films heat treated at 500°C had a thickness between 340–470 nm. |
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| Keywords: | sol-gel SiO2-M
x
O
y
thin film silicic acid metal chloride |
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