Simultaneous formation behaviour of surface structures and molecular alignment by patterned photopolymerisation

ABSTRACT

Highly functional soft materials with fine control of molecular alignment are of great interest for the applications in various fields. However, the current method of molecular alignment still has some challenges. Recently, we have developed a new alignment process based on a concept of scanning wave photopolymerisation (SWaP). When a sample is irradiated with spatially selected light, a polymerisation occurs only in an irradiated region, leading to a molecular motion between the irradiated and unirradiated regions. Such molecular motion generates the alignment of liquid crystal molecules. Moreover, a surface relief structure is formed in the polymer film by the molecular motion. In this study, we simultaneously formed the surface structure and molecular alignment by the patterned photopolymerisation. We compared the degree of molecular alignment with the shape of the created surface structure, and revealed that the degree of molecular alignment was maximized at the boundary of irradiated and unirradiated regions. This method enables one to form both molecular alignment patterning and surface structuring in a single step.