Novel optical techniques for the analysis of polymer surfaces and thin films |
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| Authors: | W. Knoll W. Hickel M. Sawodny J. Stumpe H. Knobloch |
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| Affiliation: | (1) Max-Planck-Institut für Polymerforschung, Ackermannweg 10, W-6500 Mainz, Federal Republic of Germany;(2) Present address: Sektion Chemie, Humboldt-Universität zu Berlin, Hessische Strasse 1–2, O-1040 Berlin, Federal Republic of Germany |
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| Abstract: | Summary We report on novel optical techniques, based on evanescent waves, for the characterization of polymer surfaces and thin films. We first describe photo-ablation studies with polysilane films investigated by surface plasmon microscopy, a technique which is particularly well-suited for ultrathin samples. Thicker films that are homogeneous enough to carry optical waveguide modes can be characterized with high lateral resolution by the recently developed waveguide microscopy. We demonstrate this for a thin film of a solid polyelectrolyte. Finally, we report on surface plasmon field-enhanced Raman-spectroscopic and -imaging investigations of ultrathin Langmuir-Blodgett-Kuhn-layers of cadmium arachidate.W. Hickel is now with HOECHST AG, Angewandte Physik, W-6230 Frankfurt 80 |
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