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Deposition of osmium and ruthenium thin films from organometallic cluster precursors |
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| Authors: | Chunxiang Li Weng Kee Leong Kian Ping Loh |
| Abstract: | Single‐source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)13(µ‐H)2 have been used for the chemical vapor deposition of osmium films and osmium–ruthenium alloy films, respectively. Copyright © 2009 John Wiley & Sons, Ltd. |
| Keywords: | osmium ruthenium alloy cluster CVD |