KH-570功能化石墨烯的制备与表征

采用Hummers法对天然石墨进行氧化处理制备了氧化石墨烯,通过γ-甲基丙烯酰氧丙基三甲氧基硅烷与氧化石墨烯反应得到功能化氧化石墨烯,然后在水合肼的作用下制备了功能化石墨烯。未烘干的功能化石墨烯在超声处理下,能稳定分散在体积比为9∶1(V/V)的乙醇/水、丙酮/水或N,N-二甲基甲酰胺/水的混合溶剂中。用傅立叶变换红外光谱、原子力显微镜、X射线光电子能谱及X射线衍射对样品结构、形貌进行了分析。结果表明,KH-570上的硅氧烷与氧化石墨烯上的羟基发生了反应,经水合肼还原后,功能化石墨烯的无序度增加,层间距也比功能化氧化石墨烯的缩小了。功能化石墨烯在DMF/水中呈高度剥离状态,片层厚度为1.1～2.3 nm。

Synthesis and Characterization of Functionalized Graphene with KH-570

The graphene oxide(GO) was prepared from natural graphite by the Hummers method,and then was modified by introducing 3-glycidoxypropyltrimethoxysilane(KH-570).The functionalized graphene was subsequently prepared in the presence of hydrazine hydrate.The functionalized graphene can be stably dispersed in ethanol/H2O(9∶1,V/V),acetone/H2O(9∶1,V/V) or N,N-dimethyl formamide(DMF)/H2O(9∶1,V/V).The samples were characterized by using Fourier Transform Infrared Spectroscopy(FTIR),Atomic Force Microscope(AFM),X-ray Photoelectron Spectroscopy(XPS) and X-ray diffraction(XRD).The results show that siloxane of KH-570 reacted with hydroxy group of graphene oxide;the disorder of functionalized graphene increased and the distance between functionalized graphene sheets decreased after the modified graphene oxide was reduced with hydrazine hydrate.Functionalized graphene were exfoliated into single layer or few-layers in DMF/H2O,and the thickness of sheets is between 1.1 nm and 2.3 nm.