Investigation in the interface roughness of DC-sputtered Mo/B4C multilayer mirrors with variable layer pairs for 7-nm soft X-ray polarizers |
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Authors: | Haixia Wang Dechao Xu Jie Zhu Zhong Zhang Radhwan Alnaimi Baozhong Mu Zhanshan Wang Hong Chen |
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Affiliation: | 1. MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering (IPOE), Department of Physics, Tongji University, Shanghai 200092, China;2. Department of Physics, King''s College London, Strand, London WC2R 2LS, UK |
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Abstract: | The surface and interface roughness of Mo/B4C multilayer mirrors for 7-nm soft X-ray polarizer with variable layer pairs (N = 50, 70, 90 and 110), fabricated by DC sputtering technique is investigated by atomic force microscopy and X-ray scattering and reflecting. The experimental results present that the surface and interface roughness of Mo/B4C multilayer mirrors increase layer by layer from its substrate as its Mo layer thickness greater than 2 nm, and the roughness grown tendency could be characterized by a quadratic function. |
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Keywords: | Multilayer Roughness Reflectivity Scattering |
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